Edición de la obra Handbook of Advanced Plasma Processing Techniques
| Autor | Randy J. Shul |
|---|---|
| Editorial | Springer Berlin Heidelberg, Imprint, Springer |
| Fecha de publicación | 2000 |
| Lugar | Berlin, Heidelberg |
| Idioma | inglés |
| Páginas | 653 |
| Formato | [electronic resource] / |
| ISBN-13 | 9783642569890 |
| ISBN-10 | 3642569897 |
| OCLC | 840292330 |
| Número de Cutter | S562h |
This volume covers the topic of advanced plasma processing techniques, from the fundamental physics of plasmas to diagnostics, modeling and applications such as etching and deposition for microelectronics. The use of plasmas for patterning on a submicron scale has enabled successive generations of continually smaller transistors, lasers, micromachines, sensors and magnetic read/write heads that have formed the basis of our information age. This volume is the first to give coverage to this broad area of topics in a detailed fashion, especially in the rapidly expanding fields of micro-mechanical machines, photomask fabrication, magnetic data storage and reactor modeling. It provides the reader with a broad array of topics, authored by the leading experts in the field.