Gate stack and silicide issues in silicon processing II
symposium held April 17-19, 2001, San Francisco, California, U.S.A.
Edición de la obra Gate Stack and Silicide Issues in Silicon Processing II Symposium Held April 17-19, 2001, San Francisco, California, U.S.A
| Autor | S. A. Campbell |
|---|---|
| Editorial | Materials Research Society |
| Fecha de publicación | 2002 |
| Lugar | Warrendale, PA |
| Idioma | inglés |
| ISBN-10 | 1558996060 |
| LCCN | 2002141577 |
| Serie | Materials Research Society symposium proceedings -- v. 670 · Materials Research Society symposia proceedings -- v. 670. |
| Número de Cutter | C191g |