Advances in Research and Development, Volume 23
Modeling of Film Deposition for Microelectronic Applications (Thin Films)
Edición de la obra Advances in research and development
| Autor | Maurice H. Francombe, John L. Vossen |
|---|---|
| Editorial | Academic Press |
| Fecha de publicación | September 29, 1997 |
| Idioma | inglés |
| Páginas | 311 |
| ISBN-13 | 9780125330237 |
| ISBN-10 | 0125330235 |
| Número de Cutter | F825a |